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MOIRÉ- ABERROMETER

机译:莫里·阿伯米特

摘要

An improved moiré deflectometer device (100) for measuring a wavefront aberration of an optical system (110) includes a light source (120) for illuminating a surface area (112) of the optical system, an optical relay system (140) for directing scattered light to a deflectometer component (150) that converts the wavefront into a moiré fringe pattern, a sensor/camera assembly (160) for imaging and displaying the exit pupil (114) of the optical system and the moiré fringe pattern, and a fringe pattern to calculate the wavefront aberration of the optical system, being improved by an illumination source (130) for illuminating the exit pupil (114) of the optical system; and an alignment system (180) cooperating with the illumination source in such a manner to consistently and accurately align a measurement axis of the device to the optical system. An associated method is also disclosed.
机译:用于测量光学系统(110)的波前像差的改进的莫尔偏转仪装置(100),包括用于照亮光学系统的表面(112)的光源(120),用于引导散射的光学中继系统(140)。向偏转仪组件(150)发出的光(将波前转换为莫尔条纹图案),用于成像和显示光学系统的出射光瞳(114)和莫尔条纹图案的传感器/相机组件(160)以及条纹图案计算光学系统的波前像差,通过用于照亮光学系统的出射光瞳(114)的照明源(130)来改善该波前像差;对准系统(180)与照明源配合,以一致且准确地将设备的测量轴对准光学系统。还公开了一种相关的方法。

著录项

  • 公开/公告号EP1605815B1

    专利类型

  • 公开/公告日2012-01-04

    原文格式PDF

  • 申请/专利权人 BAUSCH & LOMB;

    申请/专利号EP20040759631

  • 发明设计人 EAGAN BARRY T.;

    申请日2004-03-16

  • 分类号A61B3/103;

  • 国家 EP

  • 入库时间 2022-08-21 17:17:50

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