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Theoretical study of the properties of X-ray diffraction moiré fringes. II. Illustration of angularly integrated moiré images

机译:X射线衍射莫尔条纹特性的理论研究。二。角度整合的莫尔图像的插图

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摘要

Using a theory of X-ray diffraction moiré fringes developed in a previous paper, labelled Part I [Yoshimura (2015). Acta Cryst. A>71, 368–381], the X-ray moiré images of a silicon bicrystal having a weak curvature strain and an interspacing gap, assumed to be integrated for an incident-wave angular width, are simulation-computed over a wide range of crystal thicknesses and incident-wave angular width, likely under practical experimental conditions. Along with the simulated moiré images, the graphs of characteristic quantities on the moiré images are presented for a full understanding of them. The treated moiré images are all of rotation moiré. Mo Kα1 radiation and the 220 reflection were assumed in the simulation. The results of this simulation show that fringe patterns, which are significantly modified from simple straight fringes of rotation moiré, appear in some ranges of crystal thicknesses and incident-wave angular width, due to a combined effect of Pendellösung oscillation and an added phase difference from the interspacing gap, under the presence of a curvature strain. The moiré fringes which slope to the perpendicular direction to the diffraction vector in spite of the assumed condition of rotation moiré, and fringe patterns where low-contrast bands are produced with a sharp bend of fringes arising along the bands are examples of the modified fringe pattern. This simulation study provides a wide theoretical survey of the type of bicrystal moiré image produced under a particular condition.
机译:使用先前论文中标记为Part I的X射线衍射莫尔条纹理论[Yoshimura(2015)。 Acta Cryst。在A > 71 ,368–381]中,模拟了具有弱曲率应变和间隙间距的双晶硅的X射线莫尔像,假设它们是对入射波角宽度积分的,可能在实际实验条件下在很宽的晶体厚度和入射波角宽度范围内进行计算。除了模拟的摩尔纹图像,还提供了摩尔纹图像上的特征量图,以全面了解它们。经过处理的波纹图像都是旋转波纹。在模拟中假设MoKα1辐射和220反射。模拟结果表明,由于Pendellösung振荡和附加的相位差的共同作用,在简单的旋转莫尔条纹中显着改变的条纹图案出现在某些晶体厚度和入射波角宽度范围内在曲率应变的存在下,间距为间隙。尽管存在假定的旋转莫尔条纹,但仍会在垂直于衍射矢量的方向上倾斜的莫尔条纹和沿条纹出现条纹锐利弯曲而产生低对比度带的条纹图案是改进条纹图案的示例。 。该模拟研究提供了在特定条件下产生的双晶莫尔条纹图像类型的广泛理论研究。

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