首页> 外国专利> METHOD FOR PROCESSING SPECTRA OF RADIATION SCATTERED BY A MATERIAL IN ORDER TO OBTAIN A BASIC SPECTRUM OF RADIATION SCATTERED BY SAID MATERIAL, DEVICE AND ASSOCIATED COMPUTER PROGRAM

METHOD FOR PROCESSING SPECTRA OF RADIATION SCATTERED BY A MATERIAL IN ORDER TO OBTAIN A BASIC SPECTRUM OF RADIATION SCATTERED BY SAID MATERIAL, DEVICE AND ASSOCIATED COMPUTER PROGRAM

机译:一种处理材料散射光谱的方法,以便获得所述材料,装置和相关计算机程序散射的基本光谱

摘要

The invention relates to a method for obtaining a basic spectrum of radiation scattered by a material (100), in which: the material is exposed to an incident irradiation beam (115) emitted by a radiation source (110); a first spectrum (150) of radiation scattered by the material (100) is measured by means of a principal detector (120), arranged such that the field of observation thereof (130) intersects the irradiation beam (115) within the material (100); at least one other spectrum (152, 154, 156) of radiation scattered by the material (100), termed secondary spectrum, is measured by means of at least one secondary detector (122, 124, 126); a matrix of the measurements (X) is formed from the spectra previously measured; said matrix of measurements is broken up into two non-negative matrices, namely a weight matrix (A) and a spectrum matrix (S), the latter comprising an estimated multiple scattered radiation spectrum and an estimated primary scattered radiation spectrum.
机译:本发明涉及一种用于获得由材料(100)散射的辐射的基本光谱的方法,其中:将材料暴露于由辐射源(110)发射的入射辐射束(115);由材料(100)散射的辐射的第一光谱(150)借助于主检测器(120)测量,该主检测器布置成使得其观察场(130)与材料(100)内的辐射束(115)相交。 );由材料(100)散射的辐射的至少一个其他光谱(152、154、156),被称为次级光谱,借助于至少一个次级检测器(122、124、126)进行测量;由先前测量的光谱形成测量矩阵(X);所述测量矩阵被分解为两个非负矩阵,即权重矩阵(A)和频谱矩阵(S),后者包括估计的多个散射辐射谱和估计的初级散射辐射谱。

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