PRODUCTION METHOD FOR SILICON THIN FILM, PRODUCTION METHOD FOR SILICON THIN-FILM SOLAR CELL, SILICON THIN FILM, AND SILICON THIN-FILM SOLAR CELL

摘要

[Problem] To provide a production method for a silicon thin film, a production method for a silicon thin-film solar cell, and a silicon thin film. [Solution] A method for producing a silicon thin film (10) such that a silicon crystal (12) covers a silicon substrate (32), by: forming an inert surface (36)based on an inert layer (38) and an exposed surface (34) of the silicon substrate (32) by the selective formation on top of the silicon substrate (32) of the inert layer (38) wherein growth of the silicon crystal (12) is inert against silicon crystal (12) starting material gases (28); and supplying to the silicon substrate (32) a starting material gas (28) from among the starting material gases (28) that has dominant characteristics for a surface decomposition reaction in the silicon substrate (32), to make the silicon crystal (12) grow from the exposed surface (34). The method is characterized by forming the silicon thin film (10) so as to be releasable from the silicon substrate (32), by forming the width of the exposed surface (34) between 0.001 µm and 1 µm.