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HIGH-THROUGHPUT DEPOSITION SYSTEM FOR OXIDE THIN FILM GROWTH BY REACTIVE COEVAPORTATION
HIGH-THROUGHPUT DEPOSITION SYSTEM FOR OXIDE THIN FILM GROWTH BY REACTIVE COEVAPORTATION
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机译:活性共沉淀法用于氧化物薄膜生长的高通量沉积系统
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摘要
A heater for growing a thin film on substrates contained on a substrate support member (110) includes a plurality of heater elements (101). The substrate support member (110) containing the substrates is at least partially surrounded by the plurality of heater elements (101). At least two of the plurality of heater elements are moveable with respect to one another so as to provide external access to the substrate support member. An oxygen pocket is formed in one of the heater elements or a separate oxygen pocket member (108) and is used for oxidation of the film on the substrates.
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