SUBSTRATE FOR CVD DIAMOND DEPOSITION AND METHOD FOR FORMING DEPOSITION SURFACE

摘要

The present invention relates to a substrate for deposition which is a substrate for CVD diamond deposition that comprises a base constituted of a rigid material and, bonded to a surface thereof, a coating layer comprising a matrix and seed diamond crystals held and contained therein, wherein (1) the seed diamond crystals are diamond particles having an average particle diameter of 1 µm or less, (2) the matrix comprises one or more first metal species selected from the group of first metals consisting of Si, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, and W and/or a first-metal compound that is a compound of the first metal species and a non-metallic substance selected among boron, carbon, and nitrogen, the diamond particles having been dispersed in the matrix, and (3) at the junction between the rigid material and the coating layer, a diffusion layer has been formed by diffusion of metal atoms of the first metal species and/or atoms of a metal as a component of the rigid material. With the substrate for deposition, it is possible to form a diamond film while preventing the deposition from being affected by the components of the member, etc.