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POLYCRYSTALLINE CUPROUS OXIDE NANOWIRE ARRAY PRODUCTION METHOD USING LOW-TEMPERATURE ELECTROCHEMICAL GROWTH

机译:低温电化学生长法制备聚氧化亚铜纳米阵列的方法

摘要

The present invention relates to a polycrystalline cuprous oxide nanowire array production method using low-temperature electrochemical growth, and more specifically relates not only to a production method allowing easy vapour deposition at low temperature but also to a polycrystalline cuprous oxide nanowire array production method using low-temperature electrochemical growth which retains such characteristics as large-area growth, high-crystallinity nanowire, uniform radial distribution, and easy length and radius adjustment. The present invention concerns a polycrystalline cuprous oxide nanowire array production method comprising the steps of: producing a nanopore alumina layer (anodised alumina, AAO) from a high-purity aluminium sheet (Al sheet) by using a two-step anodising method; and producing a polycrystalline cuprous oxide nanowire array by using the nanopore alumina layer as a nanomould.
机译:本发明涉及利用低温电化学生长的多晶氧化亚铜纳米线阵列的制造方法,尤其涉及一种在低温下易于蒸镀的制造方法,还涉及利用低温电化学生长的多晶氧化亚铜纳米线阵列的制造方法。高温电化学生长,保留了诸如大面积生长,高结晶度纳米线,均匀的径向分布以及易于调节长度和半径等特性。本发明涉及一种多晶氧化亚铜纳米线阵列的制造方法,该方法包括以下步骤:通过两步阳极氧化法由高纯度铝板(Al板)制造纳米孔氧化铝层(阳极氧化铝,AAO);通过使用纳米孔氧化铝层作为纳米模具来生产多晶氧化亚铜纳米线阵列。

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