ALUMINOSILICATE GLASS HAVING HIGH THERMAL STABILITY AND LOW PROCESSING TEMPERATURE

摘要

The invention relates to an aluminosilicate glass having a thermal expansion coefficient ranging from 8 to 10 x 10^-6/K in a temperature range of 20 to 300ºC, a transformation temperature Tg ranging from 580ºC to 640ºC, and a processing temperature VA ranging from 1065ºC to 1140ºC, and thus can be used as an alternative to soda lime glass. The invention further relates to the use of the glass according to the invention in applications where high thermal resistance of the glass is advantageous, in particular as substrate glass, superstrate glass and/or cover glass in the field of semiconductor technology, preferably for Cd-Te or for CIS and/or CIGS photovoltaic applications, and for other applications in solar technology.