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Correcting Device to Compensate for Polarization Distribution Perturbations and Projection Objective for Microlithographic Projection Lens

机译:补偿微光刻投影透镜的偏振分布扰动和投影物镜的校正装置

摘要

calibration device to compensate for the disturbance in the cross-section of the beam polarization distribution (10) is described. The calibration apparatus has two parallel surfaces (24, 26,126,127), the two elements having a double refractive correction comprising (20, 22; 120a, 120b, 122; 220;; 222 320, 322) and a member (18, 118). The correction element (22,122,222), the thickness (d) of the surface; it is constant between (22, 126, 127). ; One or more correction elements (20, 22; 120a, 120b, 122; 220; 222; 320, 322) at least one surface (24, 26; 126, 127) is reprocessed, the thickness d localized and non-uniform is generated, whereby the disturbance of the polarization distribution is to be substantially compensated. Such a device, the thickness (d) and the correction element (20, 22; 120a, 120b, 122; 220; 222; 320, 322) is selected, the characteristics of the double refraction does not OSCAR a localized non-uniform in thickness d If the double-refraction effect is to be canceled each other. Correction apparatus of the present invention will only affect the polarization compensation point in the way.
机译:描述了用于补偿光束偏振分布(10)的横截面中的干扰的校准装置。校准设备具有两个平行的表面(24、26,126,127),这两个元素具有双折射校正,包括(20,22; 120a,120b,122; 220 ;; 222 320、322)和一个构件(18、118)。校正元件(22,122,222),表面的厚度(d);它在(22,126,127)之间恒定。 ;对至少一个表面(24、26; 126、127)的一个或多个校正元件(20、22; 120a,120b,122; 220; 222; 320、322)进行重新处理,厚度d局部化并且不均匀因此,偏振分布的扰动将被基本补偿。这样的装置,厚度(d)和校正元件(20、22; 120a,120b,122; 220; 222; 320、322)被选择,双折射的特性不会使OSCAR局部地不均匀。厚度d如果要抵消双折射效应。本发明的校正装置仅会影响偏振补偿点。

著录项

  • 公开/公告号KR101085737B1

    专利类型

  • 公开/公告日2011-11-21

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20057025036

  • 发明设计人 헴드 크리스찬;

    申请日2004-06-17

  • 分类号G02B5/30;G02B27/00;G02B27/28;G03F7/20;

  • 国家 KR

  • 入库时间 2022-08-21 17:11:08

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