POLYMER COMPOUND CAPABLE OF OFFERING A RESIST PROTECTION LAYER HAVING EXCELLENT WATER REPELLENCY, AND A RESIST-PROTECTIVE FILM COMPOSITION FOR AN IMMERSION LITHOGRAPHY PROCESS CONTAINING THEREOF

摘要

PURPOSE: A polymer compound and a resist-protective film composition for an immersion lithography process containing thereof are provided to offer the high receding contact angle at a liquid lithographic process, and to improve the line edge roughness of a resist.;CONSTITUTION: A polymer compound contains 100 mol parts of recurring unit marked with chemical formula 1, 10-900 mol parts of recurring unit marked with chemical formula 2, and 10-900 mol parts of recurring unit marked with chemical formula 3. The polymer compound has the weight average molecular weight of 1,000-100,000. A resist-protective film composition for an immersion lithography process contains the polymer compound, a solvent, and one compound selected from a radiation-sensitive acid generating compound or an acid compound.;COPYRIGHT KIPO 2012