OPTICAL SYSTEM FOR PRODUCING A LINE FOCUS, AND AN APPARATUS FOR TREATING A SUBSTRATE COMPRISING SUCH AN OPTICAL SYSTEM, CAPABLE OF GENERATING A LINE FOCUS IN AN IMAGE PLATE FROM AN OPTICAL BEAM ALONG ELECTRONIC WAVE DIRECTION

摘要

PURPOSE: An optical system for producing a line focus, and an apparatus for treating a substrate comprising such an optical system is provided to be optimized without the quality of the line focus of an optical system.;CONSTITUTION: A beam extending optical unit(64) extends an optical beam in first dimension perpendicular to a progressive direction. A focusing optical unit focuses an optical beam of line focus to an image plane in second dimension.;COPYRIGHT KIPO 2012