COATING COMPOSITION FOR FILTERING DEEP ULTRAVIOLET RAY, AND A PHOTO-RESIST PATTERN FORMING METHOD A SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME CAPABLE OF IMPROVING THE RESOLUTION AND THE PRECISION OF A PHOTO-RESIST STRUCTURE

摘要

PURPOSE: A coating composition for filtering deep ultraviolet ray, and a photo-resist pattern forming method a semiconductor device manufacturing method using the same are provided to precisely form micro patterns.;CONSTITUTION: A coating composition for filtering deep ultraviolet ray includes 100 parts by weight of a solvent and 0.05-5 parts by weight of coating polymer. The solvent contains a first solvent which is an alcoholic solvent. The degree of absorption of the polymer to incident light of 194nm of wavelengths is more than or equal to 50%/um. A photo-resist pattern forming method includes the following: a first layer(110) is formed on a substrate(190) based on a photo-resist composition for extreme ultraviolet ray; a second layer(120) is formed on the first layer based on the coating composition; the first layer and the second layer are exposed through an exposure mask(130); the first layer and the second layer are developed.;COPYRIGHT KIPO 2012