PHOTORESIST COMPOSITION AND A METHOD FOR FORMING PATTERNS USING THE SAME CAPABLE OF FORMING MICRO-PATTERNS OF NARROW PITCHES BY INCLUDING NOVOLAC RESIN, DIAZIDE-BASED COMPOUND, AN ORGANIC SOLVENT, AND A RUST PREVENTIVE AGENT

摘要

PURPOSE: A photoresist composition and a method for forming patterns using the same are provided to improve yield and to reduce failure rate by preventing organic materials from being remaining on a substrate.;CONSTITUTION: A photoresist composition includes 60-90 weight% of novolac resin, diazide-based compound, an organic solvent, and a rust preventive agent(310). The novolac resin includes phenol-based compound. The novolac resin is obtained by reacting the phenol-based compound with aldehyde-based compound or ketone-based compound. The diazide-based compound includes one or more of photo-sensitive agents and phenol-based compound. The phenol-based compound is bonded with a photo-sensitive agent. The rust preventive agent includes one or more of heterocyclic compound with a carbonyl group, glycol-based compound with triple bond, alkyl sarcosine metal salt compound, aromatic carbonic acid anhydride compound, and thiazole and triazole-based compound.;COPYRIGHT KIPO 2012