(METH)ACRYLATE-BASED POLYMER HARDLY OCCURRING THE GENERATION OF PATTERN LIFTING, BECAUSE OF EXCELLENT ADHESION WITH A SUBSTRATE, AND A PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME

摘要

PURPOSE: A (meth)acrylate-based polymer is provided not to generate scum because of excellent solubility to developer, to have excellent dry etching resistance and implant resistance, and to have good hydrophilicity.;CONSTITUTION: A (meth)acrylate-based polymer comprises a repeating unit in chemical formula 1-4. A photosensitive resin composition comprises the (meth)acrylate-based polymer, a photo acid generator, and solvent. The content of the (meth)acrylate-based polymer is 5-15 weight% on the basis of the weight of the photosensitive resin composition. The content of the photo acid generator is 1-15 parts by weight on the basis of the (meth)acrylate-based polymer. The photosensitive resin composition is additionally comprises 0.1-5 parts by weight of organic amine on the basis of the (meth)acrylate based polymer.;COPYRIGHT KIPO 2012