首页> 外国专利> PHOTO-SENSITIVE RESIN COMPOSITION AND A LIGHT SHIELDING LAYER USING THE SAME CAPABLE OF IMPROVING HEAT RESISTANCE CHARACTERISTIC, SHRINKAGE RESISTANCE CHARACTERISTIC, AND TAPER CHARACTERISTIC BY INCLUDING CARDO-BASED RESIN

PHOTO-SENSITIVE RESIN COMPOSITION AND A LIGHT SHIELDING LAYER USING THE SAME CAPABLE OF IMPROVING HEAT RESISTANCE CHARACTERISTIC, SHRINKAGE RESISTANCE CHARACTERISTIC, AND TAPER CHARACTERISTIC BY INCLUDING CARDO-BASED RESIN

机译:光敏树脂组合物和光屏蔽层,通过包含基于碳的树脂,可提高耐热性,耐收缩性和锥度,具有相同的能力

摘要

PURPOSE: A photo-sensitive resin composition and a light shielding layer using the same are provided to improve sensitivity, developing characteristic, and adhesion.;CONSTITUTION: A photo-sensitive resin composition includes cardo-based resin with repeating units, reactive unsaturated compounds, pigments, initiators, and solvents. One repeating unit of the cardo-based resin is represented by chemical formula 1, and another repeating unit of the cardo-based resin is chemical formula 2. In chemical formulas 1 and 2, R3, R4, R13, and R14 are identical or different and are hydrogen elements, halogen elements, or substituted or non-substituted C1 to C20 alkyl groups; R1 and R2 are identical or different and are hydrogen element or substituted or non-substituted (meta)acrylate; R11 and R12 are substituted or non-substituted (meta)acrylate; R5 is ethylenically substituted group with double bonds; Z1 and Z11 is identical or different and is single bond, O, CO, SO2, CR6R7, SiR8R9, or one of coupling groups. R6 to R9 are identical or different and are hydrogen elements or substituted or non-substituted C1 to C20 alkyl group; Z2 and Z12 are identical or different and are acid anhydride group or acid dihydride group; m1, m2, m11, m12 are the integer of 0 to 4; and n1 and n11 are 1 to 30.;COPYRIGHT KIPO 2012
机译:用途:提供一种光敏树脂组合物和使用该光敏树脂组合物的遮光层,以提高感光度,显影特性和粘合性。组成:一种光敏树脂组合物,包括具有重复单元的心基树脂,反应性不饱和化合物,颜料,引发剂和溶剂。心脏基树脂的一个重复单元由化学式1表示,并且心脏基树脂的另一个重复单元由化学式2表示。在化学式1和2中,R 3,R 4,R 13和R 14相同或不同。并且是氢元素,卤素元素,或取代或未取代的C1至C20烷基; R1和R2相同或不同,且为氢元素或取代或未取代的(甲基)丙烯酸酯; R11和R12是取代或未取代的(间)丙烯酸酯; R5是带有双键的烯键取代的基团; Z 1和Z 11相同或不同,且为单键,O,CO,SO2,CR6R7,SiR8R9或耦合基团之一。 R6至R9相同或不同,且为氢元素或取代或未取代的C1-C20烷基; Z 2和Z 12相同或不同,为酸酐基或酸酐基; m1,m2,m11,m12为0〜4的整数。和n1和n11为1到30。; COPYRIGHT KIPO 2012

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