首页> 外国专利> PHOTO-SENSITIVE RESIN COMPOSITION FOR A COLOR FILTER AND THE COLOR FILTER USING THE SAME CAPABLE OF IMPROVING THE HEAT RESISTANCE CHARACTERISTIC AND THE CHEMICAL RESISTANCE CHARACTERISTIC OF THE COMPOSITION

PHOTO-SENSITIVE RESIN COMPOSITION FOR A COLOR FILTER AND THE COLOR FILTER USING THE SAME CAPABLE OF IMPROVING THE HEAT RESISTANCE CHARACTERISTIC AND THE CHEMICAL RESISTANCE CHARACTERISTIC OF THE COMPOSITION

机译:用于彩色滤光片的光敏树脂组合物和使用改进该组合物的耐热性和耐化学性的相同功能的彩色滤光片

摘要

PURPOSE: A photo-sensitive resin composition for a color filter and the color filter using the same are provided to improve aperture ratio and the contrast ratio of the color filter.;CONSTITUTION: A photo-sensitive resin composition for a color filter includes a copolymer, an acryl-based photo-polymerizable monomer, a photo-polymerization initiator, a pigment, and a solvent. The copolymer includes a structural unit which is represented by chemical formula 1. In chemical formula 1, R1 and R2 are respectively H or substituted or non-substituted C1 to c20 alkyl group; and Y is selected from a group including structures represented by chemical formulas 2 to 4. In chemical formulas 2 to 4, R3 to R6 are respectively H or substituted or non-substituted C1 to C20 alkyl group; and X1 to X5 are respectively H, halogen, hydroxyl group, substituted or non-substituted amino group, substituted or non-substituted C1 to C20 alkyl group, allyl group, and C6 to C30 aryl group.;COPYRIGHT KIPO 2012
机译:用途:提供用于彩色滤光片的光敏树脂组合物和使用该组合物的彩色滤光片,以提高彩色滤光片的开口率和对比度。 ,丙烯酸类光聚合性单体,光聚合引发剂,颜料和溶剂。该共聚物包括由化学式1表示的结构单元。在化学式1中,R 1和R 2分别为H或取代或未取代的C 1至C 20烷基; Y选自化学式2至4所示的结构。化学式2至4中,R 3至R 6分别为H或取代或未取代的C 1至C 20烷基。 X1至X5分别为H,卤素,羟基,取代或未取代的氨基,取代或未取代的C1至C20烷基,烯丙基和C6至C30芳基。; COPYRIGHT KIPO 2012

著录项

  • 公开/公告号KR20120065135A

    专利类型

  • 公开/公告日2012-06-20

    原文格式PDF

  • 申请/专利权人 CHEIL INDUSTRIES INC.;

    申请/专利号KR20100126487

  • 发明设计人 KIM JUN SEOK;LEE CHANG MIN;LEE KIL SUNG;

    申请日2010-12-10

  • 分类号G03F7/027;G02B5/20;

  • 国家 KR

  • 入库时间 2022-08-21 17:09:45

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