首页> 外国专利> GAS DISTRIBUTION MODULE HAVING AN ELLIPTICAL FLOW PATH FOR SUCCESSIVELY PROVIDING DIFFERENT KINDS OF DEPOSITION GASES AND AN UPRIGHT TYPE DEPOSITION APPARATUS INCLUDING THE GAS DISTRIBUTION MODULE

GAS DISTRIBUTION MODULE HAVING AN ELLIPTICAL FLOW PATH FOR SUCCESSIVELY PROVIDING DIFFERENT KINDS OF DEPOSITION GASES AND AN UPRIGHT TYPE DEPOSITION APPARATUS INCLUDING THE GAS DISTRIBUTION MODULE

机译:具有椭圆流动路径的气体分配模块,用于成功提供不同种类的沉积气体和包括气体分布模块的立式沉积装置

摘要

PURPOSE: A gas distribution module having an elliptical flow path and an upright type deposition apparatus including the gas distribution module are provided to locate a substrate to be deposited in an upright position, thereby improving spatial efficiency of a deposition apparatus.;CONSTITUTION: A gas distribution module of a deposition apparatus for a flat panel display comprises a housing(131) and gas path units(310,320,330). The gas path units are formed inside the housing to form flow paths providing different kinks of deposition gases, where the flow paths are formed in an elliptical shape and include cam units(315,325). The gas path units include a first gas path unit providing precursor gas and a second gas path unit providing reactance gas. The gas distribution module accommodates a substrate in an upright position to form a thin film on the substrate.;COPYRIGHT KIPO 2012
机译:目的:提供具有椭圆形流动路径的气体分配模块和包括该气体分配模块的立式沉积设备,以将待沉积的基板定位在竖直位置,从而提高沉积设备的空间效率。用于平板显示器的沉积设备的分配模块包括壳体(131)和气体路径单元(310,320,330)。气路单元形成在壳体内部,以形成提供不同种类的沉积气体的流路,其中流路形成为椭圆形并包括凸轮单元(315,325)。气体路径单元包括提供前驱气体的第一气体路径单元和提供反应气体的第二气体路径单元。气体分配模块将基板垂直放置,以在基板上形成薄膜。; COPYRIGHT KIPO 2012

著录项

  • 公开/公告号KR20120046864A

    专利类型

  • 公开/公告日2012-05-11

    原文格式PDF

  • 申请/专利权人 K.C.TECH CO. LTD.;

    申请/专利号KR20100106694

  • 发明设计人 SUNG MYUNG EUN;SHIN IN CHUL;

    申请日2010-10-29

  • 分类号C23C16/455;C23C16/458;C23C16/46;

  • 国家 KR

  • 入库时间 2022-08-21 17:10:05

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