首页> 外国专利> MANUFACTURING PROCESS OF AN ACOUSTIC WAVE RESONATOR INCLUDING A SUSPENDED MEMBRANE FOR MANUFACTURING A BULK ACOUSTIC WAVE RESONATOR INCLUDING A SLENDER LAYER OF A PIEZOELECTRIC MATERIAL

MANUFACTURING PROCESS OF AN ACOUSTIC WAVE RESONATOR INCLUDING A SUSPENDED MEMBRANE FOR MANUFACTURING A BULK ACOUSTIC WAVE RESONATOR INCLUDING A SLENDER LAYER OF A PIEZOELECTRIC MATERIAL

机译:包括悬浮膜的声波谐振器的制造过程,该膜用于制造包括压电材料的透镜层的散装声波谐振器

摘要

PURPOSE: A manufacturing process of an acoustic wave resonator including a suspended membrane is provided to deposit contaminants degassing from the top of a surface of a bonding section with an AFM(Atomic Force Microscope) tip.;CONSTITUTION: A first stack including one ore more first piezoelectric material layers is generated on the top of the surface of a first substrate. A second stack including one or more second substrates is generated. One or more non-bonding initiating zones are formed by depositing or forming controlled sized particles of nano structures which are projected from one surface of either the first stack or the second stack. The first stack and the second stack are directly bonded. Bubble is formed between the first stack and the second stack due to the presence of the non-bonding initiating zones. The first stack is thinned in order to eliminate the first substrate.;COPYRIGHT KIPO 2012
机译:目的:提供一种包括悬浮膜的声波谐振器的制造工艺,以沉积从具有AFM(原子力显微镜)尖端的结合部分表面顶部脱气的污染物。;组成:第一叠层,包括一个或多个矿石在第一基板的表面的顶部上产生第一压电材料层。产生包括一个或多个第二基板的第二堆叠。通过沉积或形成从第一叠层或第二叠层的一个表面突出的纳米结构的受控尺寸的颗粒,形成一个或多个非结合引发区。第一堆叠和第二堆叠直接结合。由于存在非粘结起始区,所以在第一叠层和第二叠层之间形成气泡。为了减少第一个基材,对第一叠进行了减薄。; COPYRIGHT KIPO 2012

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