INFRARED LASER APPARATUS CAPABLE OF FORMING A MICROCRYSTAL SILICON LAYER AND A METHOD OF FABRICATING AN ARRAY SUBSTRATE USING THE SAME

摘要

PURPOSE: An infrared laser apparatus and a method of fabricating an array substrate using the same are provided to improve reliability since a mask for line beams is formed by coating copper on a silicon wafer.;CONSTITUTION: A first insulation layer is formed on an upper portion of a gate electrode(112). A heat conversion layer is formed on the upper portion of an amorphous silicon layer. A microcrystal silicon layer is formed by irradiating the heat conversion layer with infrared lasers of a line beam form and crystallizing the amorphous silicon layer. The microcrystal silicon layer is patterned and an active layer(116) is formed. An ohmic contact layer(120) is formed on the upper portion of the active layer. Source and drain electrodes(122, 124) are formed on the upper portion of the ohmic contact layer.;COPYRIGHT KIPO 2012