首页> 外国专利> MASK WITH TRANSPARENT PARTITION WALLS AND A LIGHT EXPOSING APPARATUS INCLUDING THE SAME CAPABLE OF SIMULTANEOUSLY ORIENTING TWO REGIONS WITH DIFFERENT ORIENTING DIRECTIONS

MASK WITH TRANSPARENT PARTITION WALLS AND A LIGHT EXPOSING APPARATUS INCLUDING THE SAME CAPABLE OF SIMULTANEOUSLY ORIENTING TWO REGIONS WITH DIFFERENT ORIENTING DIRECTIONS

机译:具有透明分隔墙的遮罩和一种曝光设备,包括可同时定向两个方向不同的区域的设备

摘要

PURPOSE: A mask with transparent partition walls is provided to simplify operational processes by reducing the number of light exposure and reducing power required for using light source.;CONSTITUTION: A transparent mask includes a plurality of transparent partition walls(30, 40). The transparent partition walls of constant intervals are parallelly formed. The transparent partition walls are capable of changing the vibration direction of incident polarized light from S polarized light to P polarized light or from P polarized light to S polarized light. The transparent partition walls are formed to halve the angle of the progress direction of two incident polarized light with different vibration directions.;COPYRIGHT KIPO 2012
机译:目的:提供具有透明分隔壁的掩模,以通过减少曝光次数和降低使用光源所需的功率来简化操作过程。;组成:透明掩模包括多个透明分隔壁(30、40)。恒定间隔的透明分隔壁平行地形成。透明分隔壁能够将入射偏振光的振动方向从S偏振光改变为P偏振光,或者从P偏振光改变为S偏振光。透明的隔墙形成为将具有不同振动方向的两个入射偏振光的传播方向的角度减半。; COPYRIGHT KIPO 2012

著录项

  • 公开/公告号KR20120069014A

    专利类型

  • 公开/公告日2012-06-28

    原文格式PDF

  • 申请/专利权人 DONGWOO FINE-CHEM CO. LTD.;

    申请/专利号KR20100112760

  • 发明设计人 KIM YONG HWAN;KIM BYOUNG IN;CHOI BONG JIN;

    申请日2010-11-12

  • 分类号G03F1/38;G03F1/50;G03F7/20;H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 17:09:41

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