DEVICE AND A METHOD FOR MEASURING A THICKNESS OF A THIN FILM, CAPABLE OF MEASURING A THIN FILM OF A SURFACE OF A HOT OBJECT ON A REAL TIME BASIS

摘要

PURPOSE: A device and a method for measuring a thickness of a thin film are provided to measure a thickness of a thin film with high reliability without a time delay because thermal radiation noise components of a hot object from a measurement spectrum of a spectroscope are removed by using a band pass filter.;CONSTITUTION: A device(100) for measuring a thickness of a thin film comprises a light source(110), a filter(120), a beam splitter(130), and a calculation unit(140). The light source irradiates lights. The filter filters the lights irradiated by the light source, thereby transmitting the lights to a steel sheet where a thin film is formed. The beam splitter obtains spectra with respect to the lights reflected from the steel sheet. The calculation unit calculates a thick ness of the thin film based on the spectra obtained by the beam splitter. The filter secludes one or more sections among wavelength sections of the irradiated lights.;COPYRIGHT KIPO 2012