首页> 外国专利> MANUFACTURING METHOD OF A THIN FILM HAVING SUPERHYDROPHOBIC SURFACE CAPABLE OF FORMING NONOSTRUCTURES HAVING VARIOUS DINSITIES BY REACTIVE ION ETCHING

MANUFACTURING METHOD OF A THIN FILM HAVING SUPERHYDROPHOBIC SURFACE CAPABLE OF FORMING NONOSTRUCTURES HAVING VARIOUS DINSITIES BY REACTIVE ION ETCHING

机译:具有能通过反应离子刻蚀形成具有各种密度的非结构的超疏水表面的薄膜的制造方法

摘要

PURPOSE: A manufacturing method of a thin film having superhydrophobic surface is provided to easily manufacture nanostructures by reactive ion etching using nanoparticles as a mask.;CONSTITUTION: A manufacturing method of a thin film having superhydrophobic surface comprises the following steps: hardening a polymer thin film by exposing the thin film to ultraviolet ray after forming a uniform polymer thin film; modifying the surface after processing the polymer thin film with oxygen plasma; fixing gold nanoparticles on the polymer thin film surface by dipping the surface modified polymer thin film into a gold nanoparticle solution; and removing the gold nanoparticles existed on the surface and washing with distilled water after performing the reactive ion etching.;COPYRIGHT KIPO 2012
机译:目的:提供一种具有超疏水表面的薄膜的制造方法,以通过使用纳米粒子作为掩模的反应性离子蚀刻容易地制造纳米结构。;组成:具有超疏水表面的薄膜的制造方法包括以下步骤:硬化聚合物薄层在形成均匀的聚合物薄膜之后,通过将薄膜暴露于紫外线来形成薄膜;用氧等离子体处理聚合物薄膜后对表面进行改性;通过将表面改性的聚合物薄膜浸入金纳米颗粒溶液中,将金纳米颗粒固定在聚合物薄膜表面上;反应离子刻蚀后去除表面上存在的金纳米颗粒并用蒸馏水洗涤。; COPYRIGHT KIPO 2012

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