首页> 外国专利> MANUFACTURING METHOD OF GLASS SUBSTRATES OF COVER GLASSES FOR PORTABLE ELECTRONIC DEVICES, A GLASS SUBSTRATE OF COVER GLASS FOR PORTABLE ELECTRONIC DEVICE AND A PORTABLE ELECTRONIC DEVICE CAPABLE OF MAINTAINING STRENGTH OF THE GLASS SUBSTRATES WITHOUT PRODUCTIVITY

MANUFACTURING METHOD OF GLASS SUBSTRATES OF COVER GLASSES FOR PORTABLE ELECTRONIC DEVICES, A GLASS SUBSTRATE OF COVER GLASS FOR PORTABLE ELECTRONIC DEVICE AND A PORTABLE ELECTRONIC DEVICE CAPABLE OF MAINTAINING STRENGTH OF THE GLASS SUBSTRATES WITHOUT PRODUCTIVITY

机译:便携式电子设备用盖玻璃的玻璃基板的制造方法,便携式电子设备用盖玻璃的玻璃基板以及能够保持玻璃基板的强度而无须生产的便携式电子装置

摘要

PURPOSE: A manufacturing method of glass substrates of cover glasses for portable electronic devices, a glass substrate of cover glass for portable electronic device and a portable electronic device are provided to primary chemical strengthening plate shaped glass ashes and to secondary chemical strengthening glass substrates.;CONSTITUTION: A manufacturing method of glass substrates of cover glasses for portable electronic devices comprises the following steps: a primary chemical strengthening the plate shaped glass ashes using an ion-exchange treatment; dividing the primary chemical strengthened glass substrate into a plurality of glass substrates(20); and a secondary chemical strengthening the plurality of glass substrates by using the ion-exchange process. The ion exchange process in the primary chemical strengthening process and the ion exchange process in the secondary chemical strengthening are processed under an identical condition or different condition. The second step is processed by the etching processing. The content rate of ion diffusion inhibitor in the secondary strengthening process is lower than thereof in the primary chemical strengthening process.;COPYRIGHT KIPO 2012
机译:用途:便携式电子设备用盖板玻璃的玻璃基板的制造方法,便携式电子设备用盖板玻璃的玻璃基板和便携式电子设备被提供给一次化学强化板状玻璃灰和二次化学强化玻璃基板。构成:一种用于便携式电子设备的盖玻片的玻璃基板的制造方法,包括以下步骤:使用离子交换法对板状玻璃灰进行一次化学强化;将一次化学强化玻璃基板分为多个玻璃基板(20);二次化学通过使用离子交换工艺来增强多个玻璃基板。在相同条件或不同条件下处理一次化学强化过程中​​的离子交换过程和二次化学强化过程中​​的离子交换过程。第二步骤通过蚀刻处理进行处理。二次强化过程中​​离子扩散抑制剂的含量低于一次化学强化过程中​​的离子扩散抑制剂。; COPYRIGHT KIPO 2012

著录项

  • 公开/公告号KR20120094860A

    专利类型

  • 公开/公告日2012-08-27

    原文格式PDF

  • 申请/专利权人 HOYA CORPORATION;

    申请/专利号KR20120015803

  • 发明设计人 HASHIMOTO KAZUAKI;TAKANO TETSUO;

    申请日2012-02-16

  • 分类号C03C21;C03C15;H04B1/38;G02F1/13;

  • 国家 KR

  • 入库时间 2022-08-21 17:09:17

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