首页> 外国专利> METHOD AND APPARATUS FOR APPLYING A PERFORATION IN AN INITIALLY FLAT LAMINATED SUBSTRATE WHEREIN THE SUBSTRATE IS FLAT AFTER IRRADIATION AND A POSSIBLE POSTTREATMENT

METHOD AND APPARATUS FOR APPLYING A PERFORATION IN AN INITIALLY FLAT LAMINATED SUBSTRATE WHEREIN THE SUBSTRATE IS FLAT AFTER IRRADIATION AND A POSSIBLE POSTTREATMENT

机译:在初始平叠层基材中穿孔的方法和设备,其中基材在辐照和可能的后处理后平整

摘要

The invention relates to a method and an apparatus for applying a perforation in a flat laminated substrate, such as a card having a thickness of at least 0.2 mm by irradiating the substrate by laser. When a perforation is applied by laser to such a card, it is often warped, leading to handling problems in the next processing steps. The invention may relate to a substrate which forms part of the booklet such as a passport. According to the invention the substrate is flat after the irradiation and a possible post treatment. According to a first embodiment the properties of the laser irradiation process are chosen such that the substrate is flat after the irradiation. According to a second embodiment the substrate is flattened after the irradiating by laser, for instance by heating the substrate.
机译:本发明涉及通过用激光辐照在至少为0.2mm的厚度的平的层压基材上的穿孔的方法和设备。当通过激光将穿孔施加到这种卡片上时,穿孔经常会翘曲,从而导致在后续处理步骤中出现问题。本发明可以涉及形成小册子之类的一部分的基底,例如护照。根据本发明,基底在辐照和可能的后处理之后是平坦的。根据第一实施例,选择激光辐照过程的性质,使得衬底在辐照之后是平坦的。根据第二实施例,在通过激光照射之后,例如通过加热基板,使基板变平。

著录项

  • 公开/公告号KR20120107505A

    专利类型

  • 公开/公告日2012-10-02

    原文格式PDF

  • 申请/专利权人 IAI INDUSTRIAL SYSTEMS B.V.;

    申请/专利号KR20127019536

  • 发明设计人 COBBEN JOHANNES IGNATIUS MARIE;

    申请日2010-12-23

  • 分类号B26F1/31;B42D15;B42D15/10;

  • 国家 KR

  • 入库时间 2022-08-21 17:09:03

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