FINE PATTERN FORMING METHOD WITH A PHOTO MASK AND A NANO-IMPRINTING MOLD BY USING BOTH THE ADVANTAGES OF SOFT LITHOGRAPHY AND PHOTO LITHOGRAPHY

摘要

PURPOSE: A fine pattern forming method with a photo mask and a nano-imprinting mold is provided to form patterns of various shapes and to form nano-sized line patterns by using micro-sized line patterns.;CONSTITUTION: A fine pattern forming method includes the following: Pattern forming resist(120) is applied on a substrate(110); a master mold with a first pattern is in contact with the upper side of the pattern forming resist; the master mold is pressurized to be imprinted; the master mold is irradiated with ultraviolet rays through a photo-mask with a second pattern which is different from the first pattern; and the master mold and the photo-mask are separated from the substrate to develop the pattern forming resist.;COPYRIGHT KIPO 2013