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METHOD FOR MANUFACTURING A PATTERNED SAPPHIRE SUBSTRATE FOR A LIGHT EMITTING DIODE CAPABLE OF IMPROVING AN ETCHING SPEED OF A MASK LAYER
METHOD FOR MANUFACTURING A PATTERNED SAPPHIRE SUBSTRATE FOR A LIGHT EMITTING DIODE CAPABLE OF IMPROVING AN ETCHING SPEED OF A MASK LAYER
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机译:用于制造能够改善面膜的蚀刻速度的发光二极管的图案化的蓝宝石基板的方法
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PURPOSE: A method for manufacturing a patterned sapphire substrate for a light emitting diode is provided to improve the luminous efficiency of a light emitting diode by forming a pattern with a sharp top part on the sapphire substrate.;CONSTITUTION: UV curable resins are coated on a mold with a preset pattern(S20). A UV curable resin layer with a transferred mold pattern is formed by compressing a sapphire substrate and the mold(S30). UV is emitted when the sapphire substrate and the mold are compressed(S40). A mask layer with the transferred mold pattern is formed on the sapphire substrate(S50). A pattern with a sharp top part is formed on the sapphire substrate by ion-etching the sapphire substrate until the mask layer is removed(S60).;COPYRIGHT KIPO 2013;[Reference numerals] (S10) Preparing mold; (S20) Coating mold with UV curable resin; (S30) Compressing a sapphire substrate and a mold; (S40) Emitting UV; (S50) Forming a mask layer; (S60) Ion etching; (S70) Thermal curing at high temperature
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