首页> 外国专利> METHOD FOR MANUFACTURING A PATTERNED SAPPHIRE SUBSTRATE FOR A LIGHT EMITTING DIODE CAPABLE OF IMPROVING AN ETCHING SPEED OF A MASK LAYER

METHOD FOR MANUFACTURING A PATTERNED SAPPHIRE SUBSTRATE FOR A LIGHT EMITTING DIODE CAPABLE OF IMPROVING AN ETCHING SPEED OF A MASK LAYER

机译:用于制造能够改善面膜的蚀刻速度的发光二极管的图案化的蓝宝石基板的方法

摘要

PURPOSE: A method for manufacturing a patterned sapphire substrate for a light emitting diode is provided to improve the luminous efficiency of a light emitting diode by forming a pattern with a sharp top part on the sapphire substrate.;CONSTITUTION: UV curable resins are coated on a mold with a preset pattern(S20). A UV curable resin layer with a transferred mold pattern is formed by compressing a sapphire substrate and the mold(S30). UV is emitted when the sapphire substrate and the mold are compressed(S40). A mask layer with the transferred mold pattern is formed on the sapphire substrate(S50). A pattern with a sharp top part is formed on the sapphire substrate by ion-etching the sapphire substrate until the mask layer is removed(S60).;COPYRIGHT KIPO 2013;[Reference numerals] (S10) Preparing mold; (S20) Coating mold with UV curable resin; (S30) Compressing a sapphire substrate and a mold; (S40) Emitting UV; (S50) Forming a mask layer; (S60) Ion etching; (S70) Thermal curing at high temperature
机译:目的:提供一种用于制造用于发光二极管的图案化蓝宝石衬底的方法,以通过在蓝宝石衬底上形成具有尖锐顶部的图案来提高发光二极管的发光效率。;组成:在其上涂覆紫外线固化树脂具有预设图案的模具(S20)。通过压缩蓝宝石衬底和模具来形成具有转印的模具图案的UV可固化树脂层(S30)。当蓝宝石衬底和模具被压缩时,会发射紫外线(S40)。在蓝宝石衬底上形成具有转印的模具图案的掩模层(S50)。通过对蓝宝石衬底进行离子蚀刻直到去除掩模层,在蓝宝石衬底上形成具有尖锐顶部的图案(S60)。COPYRIGHTKIPO 2013; [参考数字](S10)准备模具; (S20)用紫外线固化树脂涂覆模具; (S30)压缩蓝宝石基板和模具; (S40)发射紫外线; (S50)形成掩模层; (S60)离子蚀刻; (S70)高温热固化

著录项

  • 公开/公告号KR20120117354A

    专利类型

  • 公开/公告日2012-10-24

    原文格式PDF

  • 申请/专利权人 GOODP&C;

    申请/专利号KR20110035066

  • 发明设计人 AHN SU HO;

    申请日2011-04-15

  • 分类号H01L21/20;H01L33/00;

  • 国家 KR

  • 入库时间 2022-08-21 17:08:54

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