首页> 外国专利> QUARTZ CRUCIBLE FOR GROWING A SILICON CRYSTAL AND A COATING METHOD THEREOF CAPABLE OF PREVENTING DAMAGE TO A QUARTZ CRUCIBLE DUE TO REPETITIVE USE

QUARTZ CRUCIBLE FOR GROWING A SILICON CRYSTAL AND A COATING METHOD THEREOF CAPABLE OF PREVENTING DAMAGE TO A QUARTZ CRUCIBLE DUE TO REPETITIVE USE

机译:生长石英晶体的石英坩埚及其涂覆方法,能够防止由于重复使用而对石英坩埚造成损坏

摘要

PURPOSE: A quartz crucible for growing silicon crystal and a coating method thereof are provided to maintain the diameter of pinholes small enough by not including bubble on a quartz layer on which a devitrified coating is formed.;CONSTITUTION: A bubble-free quartz layer is formed on the inner side of a quartz crucible for growing a silicon crystal. The thickness of the bubble-free quartz layer is 80um to 4mm. The surface of the bubble-free quartz layer is covered with alkaline earth hydroxide. The surface of the bubble-free quartz layer is heated over a temperature at which the surface becomes devitrified.;COPYRIGHT KIPO 2013
机译:目的:提供一种用于生长硅晶体的石英坩埚及其涂覆方法,通过在其上形成失透涂层的石英层上不包括气泡,从而使针孔的直径保持足够小;组成:无气泡石英层在用于生长硅晶体的石英坩埚的内侧形成的。无气泡石英层的厚度为80um至4mm。无气泡石英层的表面覆盖有碱土金属氢氧化物。将无气泡石英层的表面加热到使表面失透的温度。; COPYRIGHT KIPO 2013

著录项

  • 公开/公告号KR20120122851A

    专利类型

  • 公开/公告日2012-11-07

    原文格式PDF

  • 申请/专利权人 FTB RESEARCH INSTITUTE CO. LTD.;

    申请/专利号KR20110071656

  • 发明设计人 SAKURAGI SHIROU;HORIOKA YUKICHI;

    申请日2011-07-19

  • 分类号C30B15/10;C03B20/00;C04B41/50;C30B29/06;

  • 国家 KR

  • 入库时间 2022-08-21 17:08:50

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