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HIGH FREQUENCY PLASMA JET SOURCE AND METHOD FOR IRRADIATING A SURFACE

机译:高频等离子体射流源和辐射表面的方法

摘要

The present invention for plasma plasma space (3) , in order to obtain a high frequency to ignite a plasma - a plasma radiation source from the electric means for applying an electric voltage to the (1) ( 8, 9) , the plasma space (3) emitted from the plasma () drawing means for drawing (4) and take-off grid (4) via a vacuum chamber (7) including a separate outlet opening a high-frequency - a plasma emission source (1) . Plasma Emission () is a high-frequency - radiation from the plasma source (1) is essentially the outlet has a diverging radiation characteristics . In addition, the present invention be of the plasma emission () radiating the high frequency - related to a method of irradiating the surface by plasma emission () of the plasma radiation source
机译:本发明用于等离子体等离子体空间(3),以便获得用于激发等离子体的高频-来自用于向(1)(8、9)施加电压的电装置的等离子体辐射源,等离子体空间(3)从用于抽吸(4)的等离子体抽吸装置(4)和起飞格栅(4)通过真空室(7)发射,该真空室包括一个单独的出口,该出口打开一个高频的等离子体发射源(1)。等离子体发射()是从等离子体源(1)发出的高频辐射,本质上是出口具有发散的辐射特性。另外,本发明涉及辐射高频的等离子体发射(-),涉及一种通过等离子体辐射源的等离子体发射()来辐射表面的方法。

著录项

  • 公开/公告号KR101112529B1

    专利类型

  • 公开/公告日2012-02-17

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20057019326

  • 发明设计人 베크만 루돌프;

    申请日2004-04-08

  • 分类号H05H1/46;H01J37/32;H01J27/16;H01J37/08;

  • 国家 KR

  • 入库时间 2022-08-21 17:08:37

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