SYSTEMS AND METHODS FOR ACHIEVING ISOTHERMAL BATCH PROCESSING OF SUBSTRATES USED FOR THE PRODUCTION OF MICRO ELECTRO MECHANICAL SYSTEMS

摘要

The substrate for a plurality of systems and methods for processing a substrate to achieve a uniform and isothermal process conditions fluid flow is provided. In one aspect, the present invention is a system and method of using that of matching the emissivity value of the surface of the process chamber opposite to the exposed surface of the substrate and the emissivity value of the exposed surface to achieve isothermal conditions throughout the substrate stack . In another aspect, the invention is a system and method for processing a substrate in a process chamber that shows excellent uniformity of the fluid stream by removing geometric irregularities in the cavity or in the process chamber profile according to the substrate loading hole. In yet another aspect, the present invention is the liner include a process chamber liner and the shell, and is constructed as a high heat conductive material such as carbon, the shell is a substrate processing system and method for being built in a non-permeable material such as stainless steel . ; A substrate processing system, process chambers, a first housing, a substrate, a first substrate, a final substrate, the emissivity value, the support means, the first substrate supporting plate, the second substrate support plate