METHOD OF DETERMINING DOSE UNIFORMITY OF A SCANNING ION IMPLANTER

摘要

Dose uniformity of the scanning ion implanter is determined. Base beam current is measured at the beginning and / or end of the last scan over the entire substrate area. This base beam current is measured when the measurement by the exhaust gas to be injected from the substrate will not be affected, then the base dose distribution map is calculated for a discussion that is scanned. During the scan itself, beam instability events are detected, the scanning position and the size of the detected instability event is measured. The deviation of the calculated base dose map are subtracted from the calculated base dose distribution map previously been modified to provide a distribution map determined. By determining the total dose uniformity by subtraction in this way, a good accuracy over the whole measurement accuracy of less beam instability events may be achieved.