APPLICATION METHOD OF TRANSPARENT ELECTRICALLY CONDUCTING COATING

摘要

FIELD: metallurgy.;SUBSTANCE: method involves reactive magnetron sputtering of metal target from alloy of indium with stannum and deposition in working chamber of coating on dielectric substrate in atmosphere of mixture of gases, which contains inert gas and oxygen with ion enhancement of coating deposition process with ion flow; coating is deposited on polymer film at value of average density of current of magnetron discharge on sputtered target surface of 180-200 A/m² and ion enhancement of coating deposition process with ion flow with energy of 20-40 eV in two stages: first in mixture of gases, which contains 20-22 vol. % of oxygen; then, in mixture of gases, which contains oxygen of not less than 60 vol. %, provided that t₁:t₂=2-3 ratio is fulfilled, where t₁ - time for carrying out the first stage of coating deposition, t₂ - time for carrying out the second stage of coating deposition.;EFFECT: use of the proposed method allows increasing service life of transparent electrodes in composition of electrochromic material, as well as improving reliability and life of optically active electrochromic glasing material.;1 tbl, 7 ex