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Method for manufacturing coaxial silicon dioxide nano-wire, that is utilized as e.g. fumed silica, for e.g. paint, involves heating solid containing side with substrate, and introducing required heat energy by concentrated solar radiation
Method for manufacturing coaxial silicon dioxide nano-wire, that is utilized as e.g. fumed silica, for e.g. paint, involves heating solid containing side with substrate, and introducing required heat energy by concentrated solar radiation
The method involves heating a solid containing a side with a catalyst-coated substrate in a form of a wafer at a temperature of 600 to 1500 degree celsius, where molecules/atoms are separated from the substrate during a gaseous phase and are deposited on a catalyst in a form of nano-wire. Required heat energy is introduced by concentrated solar radiation. The substrate is coated with an iron/nickel-containing catalyst i.e. sub-stoichiometric nickel ferrites. Gaseous raw materials react on the catalyst and reaction products are deposited on the catalyst in the form of nano-wire. The catalyst-coated substrate is selected from a group consisting of silicon-infiltrated silicon carbide, pellets, parallel channel monolith, and foam structure.
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