Mirror i.e. free-form mirror, for extreme UV-projection exposure system for extreme UV microlithography to produce structures in e.g. nanometer range for electronic components, has mirror surface, where mirror has specific surface roughness

摘要

The mirror (1) has a mirror surface with mirror sectors (2) that are integrally formed from a mirror component (5) with another mirror surface (8). The mirror has a surface roughness of less than or equal to 1 nanometer at cutoff-wavelength of less than or equal to 10 micrometers. The mirror sectors include average or maximum size in a range from 0.3 to 4 mm in diameter or in relation to a maximum edge length. The mirror component is formed from a mirror base material (3) such as silicon, silicon dioxide, glass, quartz glass or metal. An independent claim is also included for a method for manufacturing a mirror for a projection exposure system for microlithography.