首页> 外国专利> Forming wiring pattern by laser irradiation, comprises e.g. coating light-sensitive material on substrate to form light-sensitive layer and irradiating laser beam on substrate to form pattern including exposed region and unexposed region

Forming wiring pattern by laser irradiation, comprises e.g. coating light-sensitive material on substrate to form light-sensitive layer and irradiating laser beam on substrate to form pattern including exposed region and unexposed region

机译:通过激光辐照形成布线图案包括,例如。在基板上涂布感光材料以形成感光层,并在基板上照射激光束以形成包括曝光区域和未曝光区域的图案

摘要

Forming a wiring pattern by laser irradiation (S1), comprises: coating a light-sensitive material on a substrate (S11) to form light-sensitive layer; irradiating a laser beam on light-sensitive material of the substrate to form a pattern which includes an exposed region and unexposed region (S13); and forming metallic wiring pattern by placing substrate into a solution having many metallic nanoparticles (S15), where the metallic nanoparticles are attached to the exposed region, and a molecular structure of the light-sensitive material in the exposed region is changed by laser irradiation.
机译:通过激光辐照形成布线图案(S1),包括:在基板上涂覆光敏材料(S11)以形成光敏层;在基板的感光材料上照射激光束以形成包括曝光区域和未曝光区域的图案(S13);通过将基板放置在具有许多金属纳米颗粒的溶液中形成金属布线图案(S15),其中金属纳米颗粒附着到暴露区域,并且通过激光照射改变暴露区域中的光敏材料的分子结构。

著录项

  • 公开/公告号FR2972596A1

    专利类型

  • 公开/公告日2012-09-14

    原文格式PDF

  • 申请/专利权人 CRETEC CO. LTD.;

    申请/专利号FR20110051866

  • 发明设计人 HO CHIEN-HAN;HUANG HUA-MIN;

    申请日2011-03-08

  • 分类号H05K3/02;

  • 国家 FR

  • 入库时间 2022-08-21 17:04:00

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