首页> 外国专利> METHOD FOR REPRODUCING CERIUM OXIDE-BASED ABRASIVE SLURRY AND REPRODUCED CERIUM OXIDE-BASED ABRASIVE SLURRY

METHOD FOR REPRODUCING CERIUM OXIDE-BASED ABRASIVE SLURRY AND REPRODUCED CERIUM OXIDE-BASED ABRASIVE SLURRY

机译:再现基于二氧化铈的磨料浆和再现二氧化铈的磨料浆的方法

摘要

PROBLEM TO BE SOLVED: To reproduce performance as abrasive by simple reproduction processing in used abrasive slurry.;SOLUTION: This method for reproducing the cerium oxide-based abrasive slurry for polishing a glass material includes the following processes: a first process for removing polishing waste having a larger particle size than that of the abrasive from the used abrasive slurry after polishing the glass material; a second process for removing polishing waste having a smaller particle size than that of the abrasive from the used abrasive slurry after polishing the glass material; and a third process for obtaining the reproduced cerium oxide-based abrasive slurry by adding metal fluoride to recovered abrasive slurry obtained by removing the polishing waste in the first process and second process.;COPYRIGHT: (C)2013,JPO&INPIT
机译:解决的问题:通过简单地在用过的磨料浆中进行重现处理来重现磨料的性能;解决方案:这种用于抛光玻璃材料的氧化铈基磨料浆的重现方法包括以下步骤:去除抛光废料的第一步骤在抛光玻璃材料之后,具有比来自用过的磨料浆的磨料更大的粒度;第二种方法是在对玻璃材料进行抛光之后,从用过的磨料浆液中除去粒度小于磨料的抛光废料;通过将金属氟化物添加到通过第一步骤和第二步骤去除抛光废料获得的回收磨料浆中而获得再生的氧化铈基磨料浆的第三工艺。版权所有:(C)2013,JPO&INPIT

著录项

  • 公开/公告号JP2013086204A

    专利类型

  • 公开/公告日2013-05-13

    原文格式PDF

  • 申请/专利权人 SHINRYO CORP;

    申请/专利号JP20110228201

  • 申请日2011-10-17

  • 分类号B24B57/00;B24B37/00;B03B5/00;B03B5/28;C02F11/00;C09K3/14;

  • 国家 JP

  • 入库时间 2022-08-21 17:02:03

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