Method of depositing a material using a radio-frequency radiation and cathode magnetron sputtering device to rotate a cylindrical

摘要

Comprising a cathode and a radio frequency power supply, a power supply assembly, a rotating cylindrical shaft, and a drive motor, magnetron sputtering cathode apparatus for rotating a power supply assembly, the magnetic field source is positioned in the cathode in and, and a magnetic field source and extending within the cathode to transfer the target material on the outer surface of the cathode radio frequency energy. It is electrically insulated from the shaft, the electrode is formed of a non-ferrous material. As it is the cathode and the shaft while being electrically insulated while the cathode is rotated about a portion of the cathode and the magnetic field source, the shaft is mechanically connected to the cathode. Is configured to supply radio frequency energy at the frequency above 1MHz, the power supply is electrically connected to the electrode. Method of depositing a material using a magnetron sputtering cathode apparatus for a rotating cylindrical is also disclosed, magnetron sputtering cathode apparatus, the outer surface of the cathode that includes a radio frequency power supply, and a cathode which rotates a cylindrical, rotating also includes a target material formed of an oxide. Includes a step of providing radio frequency energy at the frequency above 1MHz the power supply, the step of rotating the cathode, and the step of positioning in proximity to the outer surface of the cathode substrate, whereby the method, radio frequency energy the cathode, is to inject on the substrate particles from the target material.