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Systems and methods for altering the characteristics of the patterned substrate using the ion implantation
Systems and methods for altering the characteristics of the patterned substrate using the ion implantation
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机译:使用离子注入来改变图案化衬底的特性的系统和方法
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摘要
A method of treating resist features comprises positioning, in a process chamber, a substrate having a set of patterned resist features on a first side of the substrate and generating a plasma in the process chamber having a plasma sheath adjacent to the first side of the substrate. The method may further comprise modifying a shape of a boundary between the plasma and the plasma sheath with a plasma sheath modifier so that a portion of the shape of the boundary is not parallel to a plane defined by a front surface of the substrate facing the plasma, wherein ions from the plasma impinge on the patterned resist features over a wide angular range during a first exposure.
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