Mounting table mechanism, plasma processing apparatus using the same, and method of applying voltage to electrostatic chuck

摘要

PURPOSE: A loading stage mechanism, a plasma processing apparatus using the same, and a method for supplying voltage to an electrostatic chuck are provided to increase productivity and throughput by discharging a charge rapidly. CONSTITUTION: A loading stage mechanism includes a stand, an electrostatic chuck, a DC high voltage source, a chuck switch, a direct-current component detection circuit, a bypass line, by-pass switch, and a switch control. The main stand(84) is composed of a conductive element for loading a target. An electrostatic chuck(86) is on the top of the stand and has the electrostatic chuck adsorbing the target inside it. A chucking switch(124) is arranged on a feed line and is closed when the target is absorbed. The DC component detection circuit(96) is connected with the stand and detects DC component supplied to the stand in plasma process.