首页> 外国专利> Semiconductor device quality simulation device, simulation method and program

Semiconductor device quality simulation device, simulation method and program

机译:半导体器件质量模拟装置,模拟方法和程序

摘要

P To provide a device simulation apparatus and a device simulation method and a PROGRAM that accurately analyze electric characteristics of a Schottky source/drain MOSFET at a high speed by employing the effect of quantum-mechanical tunneling through a Schottky barrier for a device simulator based ON a classical and a semiclassical transport equation. PSOLUTION: Tunneling state density by the quantum-mechanical tunneling effect through a Schottky barrier potential of the Schottky source/drain MOSFET is calculated. Total carrier density is calculated from all-state density calculated from classical state density of the Schottky barrier potential and the tunneling state density is calculated and compared with the classical carrier density calculated from the classical state density. The classical and semiclassical transport equations are solved using a corrected Schottky barrier potential obtained by varying the Schottky barrier potential so that the classical carrier density and all-carrier density become equal to each other and electric characteristics of the MOSFET are simulated. PCOPYRIGHT: (C)2010 and JPO& INPIT
机译:

提供一种器件仿真装置,器件仿真方法和程序,其通过利用穿过肖特基势垒的量子力学隧穿效应对器件仿真器进行高速,准确地分析肖特基源极/漏极MOSFET的电特性。基于经典和半经典输运方程。

解决方案:计算通过肖特基源极/漏极MOSFET的肖特基势垒电位通过量子力学隧穿效应产生的隧穿态密度。根据从肖特基势垒势的经典状态密度计算出的全态密度来计算总载流子密度,并且计算出隧穿态密度,并将其与从经典状态密度计算出的经典载流子密度进行比较。使用通过改变肖特基势垒势获得的校正肖特基势垒势来求解经典和半经典输运方程,以使经典载流子密度和全载流子密度变得彼此相等,并模拟MOSFET的电特性。

版权:(C)2010和JPO&INPIT

著录项

  • 公开/公告号JP5292936B2

    专利类型

  • 公开/公告日2013-09-18

    原文格式PDF

  • 申请/专利权人 日本電気株式会社;

    申请/专利号JP20080157464

  • 发明设计人 竹田 裕;

    申请日2008-06-17

  • 分类号H01L21/336;H01L29/78;H01L29/00;

  • 国家 JP

  • 入库时间 2022-08-21 16:58:32

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号