首页> 外国专利> METHOD FOR CALCULATING NITROGEN CONCENTRATION IN SILICON SINGLE CRYSTAL AND METHOD FOR CALCULATING RESISTANCE SHIFT AMOUNT

METHOD FOR CALCULATING NITROGEN CONCENTRATION IN SILICON SINGLE CRYSTAL AND METHOD FOR CALCULATING RESISTANCE SHIFT AMOUNT

机译:硅单晶中氮浓度的计算方法和电阻位移量的计算方法

摘要

PROBLEM TO BE SOLVED: To provide a method for calculating nitrogen concentration in a silicon single crystal for calculating a value of the nitrogen concentration even for a case that the nitrogen concentration is different, and a method for calculating a shift amount of resistance.SOLUTION: In a method for calculating nitrogen concentration in a silicon single crystal obtained by doping nitrogen, correlation between carrier concentration difference [n] to be found from difference between resistivity after heat treatment for eliminating an oxygen donor and resistivity after heat treatment for eliminating a nitrogen oxide donor, oxygen concentration [Oi], and the nitrogen concentration [N] in the nitrogen doped silicon single crystal is preliminarily found, and unknown nitrogen concentration [N] in the nitrogen doped silicon single crystal is calculated and found from the carrier concentration difference [n] and the oxygen concentration [Oi] on the basis of the correlation.
机译:要解决的问题:提供一种即使在氮浓度不同的情况下也能计算出硅单晶中氮浓度的方法,以计算氮浓度的值,以及一种计算电阻位移量的方法。在通过掺杂氮而获得的硅单晶中的氮浓度的计算方法中,根据从用于消除氧供体的热处理后的电阻率与用于消除氮氧化物的热处理后的电阻率之间的差求出的载流子浓度差[n]之间的相关性。预先求出氮掺杂硅单晶中的供体,氧浓度[Oi]和氮浓度[N],并计算出氮掺杂硅单晶中的未知氮浓度[N],并从载流子浓度差中求出[N]。 n]和氧浓度[Oi]基于相关性。

著录项

  • 公开/公告号JP2013057585A

    专利类型

  • 公开/公告日2013-03-28

    原文格式PDF

  • 申请/专利权人 SHIN ETSU HANDOTAI CO LTD;

    申请/专利号JP20110195845

  • 发明设计人 HOSHI RYOJI;KAMATA HIROYUKI;

    申请日2011-09-08

  • 分类号G01N27;H01L21/66;G01N21/35;

  • 国家 JP

  • 入库时间 2022-08-21 16:58:24

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