The lithography device which has the active lamp foot and the active lamp foot, and the manner which adjusts the active lamp foot

摘要

A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The projection system is mounted ON a reference structure of the lithographic apparatus by a mount of the lithographic apparatus. The mount includes a first piezoelectric element to exert a force ON the projection system, a second piezoelectric element to measure the force, and an interconnection member interposed between the first and second piezoelectric elements and the interconnection member comprising a cut.