SILICA PRECURSOR MATERIAL, SILICA FILM USING SILICA PRECURSOR MATERIAL, AND ANTI-GLARE GAS-BARRIER COMPACT

摘要

PROBLEM TO BE SOLVED: To provide a silica film precursor material capable of being provided with reduced reflected light and gas-barrier properties, a silica film using the silica film precursor material, and an anti-glare gas-barrier compact in which the silica film is formed.;SOLUTION: A silica film precursor material containing a silazane compound that is a silica precursor, a layered clay mineral, and an organic solvent is applied onto a substrate. A silica film is formed by heat treatment, humidification treatment, ultraviolet ray irradiation treatment, or a process in which heat treatment and ultraviolet ray irradiation treatment are simultaneously performed on the material. An anti-glare gas-barrier compact is thereby formed.;COPYRIGHT: (C)2013,JPO&INPIT