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METHOD FOR CONTROLLING COPPER SULFATE-PLATING BATH, AND METHOD FOR PRODUCING COPPER-PLATED FILM

机译:硫酸铜镀浴的控制方法和铜镀膜的生产方法

摘要

PROBLEM TO BE SOLVED: To estimate a hardener concentration in an original copper sulfate-plating bath in which a copper plated film is formed while producing a photogravure without producing a copper-plated film for physical property evaluation which is not counted among production, and particularly to provide a method for controlling the copper sulfate-plating bath to control the concentration of a hardener to be added to the plating bath in order to stably produce the copper-plated film suitable for mechanical carving and ballade peeling, particularly in the production process of the photogravure.;SOLUTION: The method for estimating a hardener concentration in the copper sulfate-plating bath includes peeling a copper ballade from a cylinder after mechanical carving, and performing the scratch test of a copper-plated film surface.;COPYRIGHT: (C)2013,JPO&INPIT
机译:要解决的问题:估计原始硫酸铜镀浴中的硬化剂浓度,在该镀铜浴中形成铜镀膜的同时产生照相凹版印刷而不生产用于物理性能评估的镀铜膜,特别是在生产中不计提供一种控制硫酸铜电镀液的方法,以控制要添加到电镀液中的硬化剂的浓度,以便稳定地生产适用于机械雕刻和压痕剥离的镀铜膜,特别是在生产过程中。解决方案:估算硫酸铜镀浴中硬化剂浓度的方法包括:在机械雕刻后从圆柱体上剥离铜压条,并对镀铜膜表面进行划痕测试。;版权:(C )2013年,日本特许厅&INPIT

著录项

  • 公开/公告号JP2013082989A

    专利类型

  • 公开/公告日2013-05-09

    原文格式PDF

  • 申请/专利权人 TOPPAN PRINTING CO LTD;

    申请/专利号JP20120052941

  • 发明设计人 KUBOTA HIDETOSHI;WARIKASHI AKIRA;

    申请日2012-03-09

  • 分类号C25D21/14;C25D21/12;C25D1/00;

  • 国家 JP

  • 入库时间 2022-08-21 16:57:28

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