Management apparatus and method for particle inspection and analysis of surface processing equipment or thin film deposition apparatus

摘要

PROBLEM TO BE SOLVED: To optimize management of the countermeasures against the cause of pollution particles which deposit on an object to be processed, based on the cause of the pollution.;SOLUTION: Data processing and management equipment 1, comprises a function modeling part 2 for making a mathematical model of a relation between measured numbers of particles which deposit on a substrate during processing in a surface structuring device or a film forming device and accumulated amount processed after cleaning up of the device by a functional equation, based on the cause of the deposit of the particles; and a comparison determining part 3 for specifying the cause of the deposit of particles by comparing the model function with the measured numbers of particles; and a method thereof.;COPYRIGHT: (C)2009,JPO&INPIT