首页> 外国专利> Attaching kimono removal manner, and attaching kimono removal device

Attaching kimono removal manner, and attaching kimono removal device

机译:附加和服去除方式以及附加和服去除装置

摘要

P To remove a deposit adhered to a cleaning object surface at low cost in a low-pressure chamber which is kept at an atmospheric pressure lower than the outside atmospheric pressure. PSOLUTION: The method for removing a deposit includes: compressing and discharging air which is taken inside the low-pressure chamber lower in atmospheric pressure than the outside atmospheric pressure by a compressor installed in the low-pressure chamber; thereby injecting DRY ice particles to the cleaning object surface in the low-pressure chamber; and removing the deposit adhered to the cleaning object surface by the collision energy by the injection. The air quantity to be taken per unit time by the compressor is substantially equalized to the air quantity to be discharged per unit time by the compressor. PCOPYRIGHT: (C)2012 and JPO& INPIT
机译:

在保持在低于外界大气压的大气压的低压室中以低成本去除附着在清洁对象表面上的沉积物。

解决方案:去除沉积物的方法包括:通过安装在低压室中的压缩机压缩和排放在低压室中吸入的空气,该低压室的大气压力低于外界大气压力。从而将干冰颗粒注入低压室中的清洁对象表面。通过注入通过碰撞能量去除附着在清洁对象表面上的沉积物。压缩机每单位时间要吸收的空气量基本上等于压缩机每单位时间要排放的空气量。

版权:(C)2012和JPO&INPIT

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号