Cluster film forming apparatus and film forming method, and cluster generation apparatus and method for generating

摘要

The invention provides a cluster film formation system in which, in a cluster formation container 5, target 1 is irradiated with laser beams 2 to generate material vapor, which generates a shock wave 4 of an inert gas, and the shock wave 4 is reflected by a wall of the cluster formation container 5 to confine the material vapor having progressed in a particular region, and atoms or molecules of the material vapor and the inert gas collide with each other mutually to form groups of clusters, which are made to flow out through an outflow window 7, and sprayed deposited on a substrate 9 to form a cluster film 10. Corresponding to augmentation of energy strength of the laser beams 2, a cross section area of the laser beams 2 on the surface of the target is made large, thereby an increase in the amount of generation of the material vapor and efficient generation of the shock wave of the inert gas both are realized, and at the same time, the cluster formation container is enlarged so that the reflected wave of the shock wave meets conditions for confining the material vapor.