Metal alkoxide chemical compound, the metal alkoxide chemical compound which is displayed with the raw materials for thin film formation and

摘要

PPROBLEM TO BE SOLVED: To impart the properties such as decomposition properties by heat and/or oxidation, heat stability, vapor pressure and the like conforming as the film-forming raw material, particularly a CVD raw material to a precursor for supplying titanium, zirconium or hafnium to a film in the process for preparing the film which has a vaporization step. PSOLUTION: The metal alkoxide compound is represented by formula (1) (wherein RSP1/SPto RSP8/SPare each hydrogen or a methyl group and M is titanium, zirconium or hafnium). PCOPYRIGHT: (C)2008,JPO&INPIT