The NiW sintering target material in order to form the Ni alloy center of perpendicular recording media

摘要

P To provide an Ni-W based target material in which the variation of an Ni-W based alloy film for an intermediate layer of a vertical magnetic recording medium deposited by sputtering can be suppressed. PSOLUTION: The Ni-W based sintered target material comprises, by atom and 3 to 15% W, and the balance Ni with inevitable impurities and in which intensity ratio obtained from an Ni solid solution as an fcc phase in the X-ray diffraction of the sintered target material satisfy 0.30≤ I (200) /I (111) ≤ 0.50 and 0.10≤ I (220) /I (111) ≤ 0.30. PCOPYRIGHT: (C)2009 and JPO& INPIT