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When passing by the meniscus which is formed the entrance mark which is left by the substrate treatment meniscus and/or by
When passing by the meniscus which is formed the entrance mark which is left by the substrate treatment meniscus and/or by
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机译:当经过弯月面时,底物处理弯月面和/或
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摘要
A carrier for supporting a substrate being processed by the meniscus formed by the proximity head of the lower carrier to reduce the exit marked inlet and / or marks left by the present invention relates a substrate processing meniscus and [SOLUTION] upper it is explained. The carrier includes a frame having an opening sized to receive the substrate, and a plurality of support pins for supporting a substrate in the open mouth. The opening, you have slightly larger than the substrate gap to be present between the aperture and the substrate. Means for reducing the frequency and the size of the outlet marked inlet and / or marks on the substrate is provided a means to promote and assist the evict from the gap of the liquid from the meniscus. Method for reducing the frequency and the size of the entrance and exit marking marks are also provided. [Selection Figure] Figure 6A
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