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When passing by the meniscus which is formed the entrance mark which is left by the substrate treatment meniscus and/or by

机译:当经过弯月面时,底物处理弯月面和/或

摘要

A carrier for supporting a substrate being processed by the meniscus formed by the proximity head of the lower carrier to reduce the exit marked inlet and / or marks left by the present invention relates a substrate processing meniscus and [SOLUTION] upper it is explained. The carrier includes a frame having an opening sized to receive the substrate, and a plurality of support pins for supporting a substrate in the open mouth. The opening, you have slightly larger than the substrate gap to be present between the aperture and the substrate. Means for reducing the frequency and the size of the outlet marked inlet and / or marks on the substrate is provided a means to promote and assist the evict from the gap of the liquid from the meniscus. Method for reducing the frequency and the size of the entrance and exit marking marks are also provided. [Selection Figure] Figure 6A
机译:一种用于支撑由下部托架的接近头形成的弯月面所处理的基板的托架,以减少出口标记的入口和/或本发明所留下的痕迹,该基板涉及弯月面,并且在上面对其进行了说明。载体包括具有开口的框架,该开口的尺寸适于容纳基板,以及用于在开口中支撑基板的多个支撑销。开口要比孔和基板之间存在的基板间隙稍大。提供了用于减小出口的频率和尺寸的装置,该出口的频率和尺寸在基板上标记为入口和/或标记,该装置用于促进和辅助从弯液面的液体间隙中排出。还提供了减小入口标记和出口标记的频率和尺寸的方法。 [选择图]图6A

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