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Coitus treatment manner to substrate, diamond microstructure body and its production manner

机译:对基体,金刚石微结构体的共修处理方式及其生产方式

摘要

P To provide a technique capable of producing a fine structure only by diamond film deposition without using an etching process for diamond regarding a seeding treating method to a substrate, a diamond fine structure obtained by subjecting the surface of the obtained diamond-seeded substrate to diamond crystal growth and a method for producing the same. PSOLUTION: Disclosed is a seeding treatment method of diamond particulates to a substrate P1 in which only the specified part of a substrate is subjected to seeding, wherein seeding is performed only to the surface of the substrate which has been subjected to oxygen terminal treatment, and the surface of the substrate which has been subjected to hydrogen terminal treatment is not subjected to seeding and by using nano diamond fine particles. Also disclosed are a diamond fine structure obtained by subjecting the surface of the obtained diamond-seeded substrate to diamond crystal growth and a method for producing the same. PCOPYRIGHT: (C)2009 and JPO& INPIT
机译:& P&提供一种无需对晶种进行基板的播种处理方法就可以仅通过金刚石膜沉积而无需对金刚石进行蚀刻处理而生成微细结构的技术,该金刚石微细结构通过对得到的金刚石制种有金刚石的基板的表面进行处理而得到。金刚石晶体生长及其制备方法。

解决方案:公开了一种金刚石颗粒到衬底P1上的晶种处理方法,其中仅对衬底的特定部分进行晶种,其中仅对已经经历了氧末端的衬底的表面进行晶种进行氢末端处理的基材表面不进行晶种和使用纳米金刚石细颗粒。还公开了通过使所获得的金刚石播种衬底的表面经受金刚石晶体生长而获得的金刚石精细结构及其制造方法。

版权:(C)2009和JPO&INPIT

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